1. Transistor capacitances
Weste and Harris §2.3, pages 68—73.
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Gate capacitance
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Channel capacitance
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Gate-Drain overlap
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Gate-Source overlap
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Diffusion (pn-junction) capacitances
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bottom area
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side wall perimeter
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2. BSIM4 MOSFET model
BSIM3 is a physics-based, accurate, scalable, robust and predictive MOSFET SPICE model for circuit simulation and CMOS technology development. It is developed by the BSIM Research Group in the Department of Electrical Engineering and Computer Sciences (EECS) at the University of California, Berkeley. The third iteration of BSIM3, BSIM3 Version 3 (commonly abbreviated as BSIM3v3), was established by SEMATECH as the first industry-wide standard of its kind in December of 1996. BSIM3v3 has since been widely used by most semiconductor and IC design companies world-wide for device modeling and CMOS IC design.
https://www.bsim.berkeley.edu/models/bsim3
From the 0.5 μm process with λ=0.3 μm: c5.txt:
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XL= (drawn channel length) - (actual channel length) -
CJwithMJ -
CJSWandCJSWGwithMJSWandMJSWG -
CGDOandCGSO